About Nano3D Systems

Nano3D Systems was founded in 2008 by Dr. Val Dubin to create a metallization process suitable for the next generations in microsystems manufacturing.

Dr. Dubin is a recognized expert in the materials processing and semiconductor fields, with over 30 years experience and over 250 patents and publications. The Nano3D Systems’ management team has a combined 150 years of experience with both innovative start-up companies and global leaders.

At NANO3D SYSTEMS LLC we develop and supply customers a wide range of plating products, backed by industry finest customer support and technical expertise. Capabilities include chemical formulations and manufacturing at ISO 9001:2015 certified facilities, multiple convenient size packages, excellent quality control and global distribution system.

Latest products

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Our Mission & Vision

Nano3D Systems provides revolutionary eLOCOSTM metallization technology and proprietary process chemicals to enable novel 3D microsystems and chipset architectures on a wide variety of substrates.

Our Vision

To be a leading supplier of electrochemical metallization technology and process materials that enable life changing breakthroughs .

What can eLOCOS(TM) do?

  • Through-substrate holes and blind vias plating for advanced packaging of 2.5D and 3D microchips.
  • Electroless metal photo-patterning on flexible or rigid substrates.
  • Plating of controlled expansion interconnects.
  • Conformal plating of microparticles.
  • And more…ask about our R&D and process development services.

Featured Projects

Via Superfill

Void-free plating of high-aspect-ratio blind and through-substrate vias in glass, silicon and polymers.

Electroless Metal Photo-Patterning

UV-litho or laser direct imaging of photosensitive catalytic nanolayers followed by selective plating.

Conformally coated microparticles

Metal shells over regular or irregularly shaped small particles.

Featured Products

eLOCOS(TM) Plating Solutions

Electroplating and electroless plating solutions, photoplating solutions and process development. Controlled metallization of fine features for high-tech applications at reduced costs.

Selective

Nano3D Systems’ exclusive catalytic photoresist can be dipped, spun or sprayed onto a wide variety of substrates. Patterns can be generated with standard UV photolithography or maskless laser lithography.

Low cost & Scalable

eLOCOS(TM) solutions are appropriate for both low-volume proof-of-concept or R&D projects and high-volume production lines. Nano3D Systems??proprietary plating materials can reduce metallization costs by 1/3 or more.

Flexible and adaptable

Processes can be adjusted to fit your needs.

NANO3D SYSTEMS LLC is NSF SBIR and an ONAMI Company

NANO3D SYSTEMS LLC is proud to be a recipient of NSF SBIR Phase I and Phase II awards

Nano3D Systems is proud to be an Oregon Nanoscience and Microtechnology Institute (ONAMI) portfolio company since 2015.