$227.45 – $517.96
250 ml and 1 Liter poly bottles for Part A and B, 5 ml and 20 ml glass bottles for Part C, meeting UN requirements, unless otherwise specified.
Quality and Deposits Characteristics
Features and Benefits
Photopatternable Catalytic Resist is a spray-, dip-, or spin-deposited solution that can be patterned using UV-irradiation. The photopatterned catalytic resist is used for electroless deposition of various metals and metal alloys with feature sizes and spacings as small as ˂ 5 μm. NANO3D’s photopatternable catalytic resist can coat surfaces conformally, allowing high-resolution electroless metal deposition onto complex substrate geometries.
Download Safety Data Sheet of Part A, Part B and Part C. Contact NANO3D SYSTEMS LLC for Certificate of Analysis.
SPECIFICATION (REV. 1 091017)
ELECTROLESS PLATEABLE TiOx-Pd PHOTORESIST KIT
PLATING KIT FORMULATION:
Plateable Catalytic Photoresist
titanium butoxide in IPA
oxalic acid in IPA
PdCl2/HCl in IPA
SHELF LIFE: These solutions have 12 months shelf life.
Packaging: 250 ml and 1 L poly bottles for Part A and Part B, 5 ml and 20 ml glass bottles for Part C. Larger packages are available upon request.